Development and Up-Scaling of the hot filament process for diamond CVD
Research of hot-filament CVD technology constantly continues to provide new scientific developments that are transferred into economically functioning products. This business model enabled the establishment of the worldwide largest experimental CVD facility.
- Upscaling of the hot-filament diamond surface area up to 10.000cm2.
- Flexible chamber set up to coat small (weight < 1 g) as well as large components (weight > 40 kg) via CVD.
- Reduction of energy input (electric power/carat) for hot-filament CVD.
- Homogenisation of diamond growth rate and boron doping for a 2D and 3D substrates.
- Reproducible substrate temperature ranging from 650 °C to 950 °C.
- Integration of heat treatment during the hot-filament process.
- Development of in-situ measurements, e.g. online measurement of diamond growth rate.
Self-supporting nanocrystalline diamond foils: Influence of template morphologies on the mechanical properties measured by ball on three balls testing
In: Acta Materialia 59 (2011), p. 3343-3351
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Monitoring oxygen species in diamond hot-filament CVD by zircon dioxide sensors
In: Vacuum 82 (2008), p. 599-607
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Improved flow conditions in diamond hot filament CVD-Promising deposition results and gas phase characterization by laser absorption spectroscopy
In: Vacuum 81 (2007), p. 619-626
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Diamond single crystal growth in hot filament CVD
In: Diamond and Related Materials 15 (2006), p. 536-541
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Chemical vapor infiltration (CVI) - Part II: Infiltration of porous substrates with diamond by using a new designed hot-filament plant
In: Diamond and Related Materials 15 (2006), p. 49-54
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